Invention Grant
- Patent Title: Apparatus and method for extended nitride layer in a flash memory
- Patent Title (中): 闪存中的延伸氮化物层的装置和方法
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Application No.: US12706710Application Date: 2010-02-16
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Publication No.: US08208296B2Publication Date: 2012-06-26
- Inventor: Timothy Thurgate , Shenqing Fang , Kuo Tung Chang , Youseok Suh
- Applicant: Timothy Thurgate , Shenqing Fang , Kuo Tung Chang , Youseok Suh
- Applicant Address: US CA Sunnyvale
- Assignee: Spansion LLC
- Current Assignee: Spansion LLC
- Current Assignee Address: US CA Sunnyvale
- Agency: Frommer, Lawrence & Haug LLP
- Agent Matthew M. Gaffney
- Main IPC: G11C11/34
- IPC: G11C11/34

Abstract:
A method and apparatus for storing information is provided. A core region of memory includes a semiconductor layer, at least one shallow trench, an insulator, and a charge-trapping layer. The semiconductor layer includes at least one source/drain region, and the insulator disposed above the source/drain region. The charge trapping layer is within the insulator, and the charge trapping layer is above the entire width of the source/drain region, and extends at least one angstrom beyond the width of the source/drain region, so that a portion the charge trapping layer extends into at least one shallow trench.
Public/Granted literature
- US20110199819A1 APPARATUS AND METHOD FOR EXTENDED NITRIDE LAYER IN A FLASH MEMORY Public/Granted day:2011-08-18
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