Invention Grant
- Patent Title: High flux photon beams using optic devices
- Patent Title (中): 使用光学器件的高通量光子束
-
Application No.: US12710064Application Date: 2010-02-22
-
Publication No.: US08208602B2Publication Date: 2012-06-26
- Inventor: Susanne Madeline Lee , Peter Michael Edic , Vanita Mani , Forrest Frank Hopkins , Eberhard Neuser
- Applicant: Susanne Madeline Lee , Peter Michael Edic , Vanita Mani , Forrest Frank Hopkins , Eberhard Neuser
- Applicant Address: US NY Niskayuna
- Assignee: General Electric Company
- Current Assignee: General Electric Company
- Current Assignee Address: US NY Niskayuna
- Agent Scott J. Asmus
- Main IPC: H05G2/00
- IPC: H05G2/00
Abstract:
A system for producing at least one high flux photon beam is provided. The system includes two or more photon sources configured to produce photon beams, and at least one first stage optic device coupled to at least one of the photon sources and providing at least one focused photon beam through total internal reflection, wherein at least one of the photon beams and the focused photon beams are combined at a virtual focal spot.
Public/Granted literature
- US20110206187A1 HIGH FLUX PHOTON BEAMS USING OPTIC DEVICES Public/Granted day:2011-08-25
Information query
