Invention Grant
US08209639B2 Identifying layout regions susceptible to fabrication issues by using range patterns 有权
通过使用范围模式识别易受制造问题影响的布局区域

Identifying layout regions susceptible to fabrication issues by using range patterns
Abstract:
A range pattern is matched to a block of an IC layout by slicing the layout block and the range pattern, followed by comparing a sequence of widths of layout slices to a sequence of width ranges of pattern slices and if the width of any layout slice falls outside the width range of a corresponding pattern slice then the layout block does not match the range pattern. If the comparison succeeds, further comparisons are made between a sequence of lengths of layout fragments in each layout slice and a sequence of length ranges of pattern fragments in corresponding pattern slices. If the length of any layout fragment falls outside the length range of a corresponding pattern fragment then the block does not match the range pattern. If all lengths are within their respective ranges, then the block matches the pattern, although additional constraints are checked in some embodiments.
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