Invention Grant
- Patent Title: Method and apparatus for detecting foreign matter attached to peripheral edge of substrate, and storage medium
- Patent Title (中): 用于检测附着于基板周边的异物的方法和装置以及存储介质
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Application No.: US12506440Application Date: 2009-07-21
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Publication No.: US08210742B2Publication Date: 2012-07-03
- Inventor: Tsuyoshi Moriya , Eiichi Nishimura
- Applicant: Tsuyoshi Moriya , Eiichi Nishimura
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2008-189101 20080722
- Main IPC: G01N25/72
- IPC: G01N25/72 ; G01N21/94 ; G01N21/952 ; H01L21/302 ; H01L21/66
Abstract:
A foreign matter detecting method of detecting foreign matter attached to a peripheral edge of a substrate, which makes it possible to accurately detect foreign matter attached to the peripheral edge of the substrate even if the foreign matter is of a minute size below the detection limit of an existing measuring instrument, and which is highly versatile and suitable for mass production of substrates. The substrate is cooled to condense moisture around the foreign matter attached to the peripheral edge of the substrate, and then the condensed moisture is iced to grow an ice crystal. Then, the foreign matter attached to the peripheral edge of the substrate, which is emphasized by the ice crystal, is detected.
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