Invention Grant
- Patent Title: Diaphragm flexure with large range and high load capacity
- Patent Title (中): 隔膜挠曲大范围和高负载能力
-
Application No.: US12425647Application Date: 2009-04-17
-
Publication No.: US08210840B2Publication Date: 2012-07-03
- Inventor: Vijay Shilpickandula , Kamal Youcef-Toumi
- Applicant: Vijay Shilpickandula , Kamal Youcef-Toumi
- Applicant Address: US MA Cambridge
- Assignee: Massachusetts Institute of Technology
- Current Assignee: Massachusetts Institute of Technology
- Current Assignee Address: US MA Cambridge
- Agency: Gesmer Updegrove LLP
- Main IPC: B29C59/00
- IPC: B29C59/00
Abstract:
A stamping structure for imprinting micro-sized features is provided. The stamping structure includes a flexure arrangement having one or more diaphragm flexures arranged in a series or parallel or hybrid configuration so as to manage load-capacity while still achieving adequate vertical and angular range of a sample supported on the one or more diaphragm flexures.
Public/Granted literature
- US20090260213A1 DIAPHRAGM FLEXURE WITH LARGE RANGE AND HIGH LOAD CAPACITY Public/Granted day:2009-10-22
Information query
