Invention Grant
US08210906B2 Slicing method and method for manufacturing epitaxial wafer 有权
用于制造外延晶片的切片方法和方法

Slicing method and method for manufacturing epitaxial wafer
Abstract:
A wafer slicing method includes winding a wire around rollers and pressing the wire against an ingot while supplying slurry to the rollers. A previously conducted experiment provides a supply temperature profile of the slurry during the slicing process and the relationship to the axial displacement of the rollers. This relationship is used to implement slurry delivery during the slicing process. The resultant wafers are bowed in a uniform direction. This slicing method provides excellent reproducibility in addition to producing wafers that are bowed in a uniform direction.
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