Invention Grant
- Patent Title: Single phase fluid imprint lithography method
- Patent Title (中): 单相流体压印光刻法
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Application No.: US12026022Application Date: 2008-02-05
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Publication No.: US08211214B2Publication Date: 2012-07-03
- Inventor: Frank Y. Xu , Niyaz Khusnatdinov
- Applicant: Frank Y. Xu , Niyaz Khusnatdinov
- Applicant Address: US TX Austin US TX Austin
- Assignee: Molecular Imprints, Inc.,Board of Regents, The University of Texas
- Current Assignee: Molecular Imprints, Inc.,Board of Regents, The University of Texas
- Current Assignee Address: US TX Austin US TX Austin
- Agent Cameron A. King
- Main IPC: B01D19/00
- IPC: B01D19/00

Abstract:
The present invention is directed toward a method for reducing pattern distortions in imprinting layers by reducing gas pockets present in a layer of viscous liquid deposited on a substrate. To that end, the method includes varying a transport of the gases disposed proximate to the viscous liquid. Specifically, the atmosphere proximate to the substrate wherein a pattern is to be recorded is saturated with gases that are either highly soluble, highly diffusive, or both with respect to either the viscous liquid, the substrate, the template, or a combination thereof. Additionally, or in lieu of saturating the atmosphere, the pressure of the atmosphere may be reduced.
Public/Granted literature
- US20080141862A1 Single Phase Fluid Imprint Lithography Method Public/Granted day:2008-06-19
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