Invention Grant
US08211241B2 Washing device and washing method for substrate for magnetic recording medium 有权
用于磁记录介质的衬底的洗涤装置和洗涤方法

  • Patent Title: Washing device and washing method for substrate for magnetic recording medium
  • Patent Title (中): 用于磁记录介质的衬底的洗涤装置和洗涤方法
  • Application No.: US12515875
    Application Date: 2007-11-27
  • Publication No.: US08211241B2
    Publication Date: 2012-07-03
  • Inventor: Satoru Ueno
  • Applicant: Satoru Ueno
  • Applicant Address: JP Tokyo
  • Assignee: Showa Denko K.K.
  • Current Assignee: Showa Denko K.K.
  • Current Assignee Address: JP Tokyo
  • Agency: Sughrue Mion, PLLC
  • Priority: JP2006-319794 20061128
  • International Application: PCT/JP2007/072850 WO 20071127
  • International Announcement: WO2008/069051 WO 20080612
  • Main IPC: B08B3/04
  • IPC: B08B3/04
Washing device and washing method for substrate for magnetic recording medium
Abstract:
A washing device of a substrate for a magnetic recording medium of the present invention includes an immersion tank; a plurality of screw conveyors that are provided in the immersion tank and that hold the substrates for a magnetic recording medium; and a rotation mechanism that causes synchronous rotation of and supports the plurality of screw conveyors, wherein both ends of main shafts of the screw conveyors are provided outside of the immersion tank, the main shafts of these screw conveyors penetrate the tank walls of the immersion tank in a non-contact manner, and the plurality of substrates for a magnetic recording medium that are held by the plurality of screw conveyors are washed by a wet process using a washing liquid that is contained in the immersion tank.
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