Invention Grant
- Patent Title: Material for transparent conductive film and transparent conductive film
- Patent Title (中): 透明导电膜材料和透明导电膜
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Application No.: US12531442Application Date: 2008-03-14
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Publication No.: US08211337B2Publication Date: 2012-07-03
- Inventor: Akira Hasegawa , Takeshi Hattori , Yuzo Shigesato
- Applicant: Akira Hasegawa , Takeshi Hattori , Yuzo Shigesato
- Applicant Address: JP Tokyo
- Assignee: Sumitomo Chemical Company, Limited
- Current Assignee: Sumitomo Chemical Company, Limited
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2007-068044 20070316
- International Application: PCT/JP2008/055188 WO 20080314
- International Announcement: WO2008/114850 WO 20080925
- Main IPC: H01B1/08
- IPC: H01B1/08 ; C23C14/24

Abstract:
The present invention relates to a material for making a transparent conductive film, and a transparent conductive film. The material for making the transparent conductive film is composed of a mixed metal oxide comprising Zn, Sn, O, and at least one doping element selected from the group consisting of Sc, Bi, Cu, Y, La, Ag, and Au.
Public/Granted literature
- US20100044649A1 MATERIAL FOR TRANSPARENT CONDUCTIVE FILM AND TRANSPARENT CONDUCTIVE FILM Public/Granted day:2010-02-25
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