Invention Grant
US08211613B2 Photoradical polymerization initiator, radical generator, photosensitive compound and photosensitive resin composition containing these materials and product or its accessory portions using the composition
失效
光自由基聚合引发剂，自由基发生剂，感光性化合物和含有这些材料的感光性树脂组合物和使用该组合物的产品或其附件部分
- Patent Title: Photoradical polymerization initiator, radical generator, photosensitive compound and photosensitive resin composition containing these materials and product or its accessory portions using the composition
- Patent Title (中): 光自由基聚合引发剂，自由基发生剂，感光性化合物和含有这些材料的感光性树脂组合物和使用该组合物的产品或其附件部分
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Application No.: US12166449Application Date: 2008-07-02
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Publication No.: US08211613B2Publication Date: 2012-07-03
- Inventor: Katsuya Sakayori
- Applicant: Katsuya Sakayori
- Applicant Address: JP Tokyo-to
- Assignee: Dai Nippon Printing Co., Ltd.
- Current Assignee: Dai Nippon Printing Co., Ltd.
- Current Assignee Address: JP Tokyo-to
- Agency: Ladas & Parry LLP
- Priority: JP2002-097956 20020329; JP2002-098006 20020329; JP2002-262015 20020906; JP2002-288065 20020930; JP2002-288068 20020930
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/30 ; A61K31/473 ; C07D221/14 ; C07D471/06
Abstract:
The present invention provides a radical generator having a naphthalimide structure or a crosslinking agent and a photosensitive compound having a function as a radical generator. A photoradical polymerization initiator of the present invention comprises a compound (a) having only one naphthalimide structure-containing group in one molecule. The radial generator of the present invention comprises a compound (c) having two or more naphthalimide structure-containing groups in one molecule and also functions as a crosslinking agent. A first photosensitive compound of the present invention comprises a compound (d) having a naphthalimide structure-containing group and an ethylenic unsaturated group in one molecule. A second photosensitive compound of the present invention comprises a polymer (e) of one or more radical polymerizable compounds containing the compound (d). A photosensitive resin composition according to the present invention contains, as an essential component, the above compound (a), compound (c), compound (d) or polymer (e).
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Information query
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