Invention Grant
US08211619B2 Positive photosensitive composition, positive permanent resist, and method for producing positive permanent resist 失效
正性光敏组合物,正永久抗蚀剂,以及生产正永久抗蚀剂的方法

Positive photosensitive composition, positive permanent resist, and method for producing positive permanent resist
Abstract:
The present invention provides: a positive photosensitive composition that yields an insulation layer superior not only in high transparency, but also in heat resistance enduring a temperature during the production of a substrate, solvent resistance, and anti-aging property as a permanent resist; a positive permanent resist utilizing the positive photosensitive composition; and a method for producing the positive permanent resist. The present invention provides: a positive photosensitive composition containing (A) a curable silicone resin having a silanol group, which resin has a structure obtained by a reaction between one or more cyclic siloxane compounds represented by the following general formula (1): and one or more arylalkoxysilane compounds represented by the following general formula (2): (B) diazonaphthoquinones, and (C) a solvent; a positive permanent resist using the positive photosensitive composition; and a method for producing the positive permanent resist.
Information query
Patent Agency Ranking
0/0