Invention Grant
US08211619B2 Positive photosensitive composition, positive permanent resist, and method for producing positive permanent resist
失效
正性光敏组合物,正永久抗蚀剂,以及生产正永久抗蚀剂的方法
- Patent Title: Positive photosensitive composition, positive permanent resist, and method for producing positive permanent resist
- Patent Title (中): 正性光敏组合物,正永久抗蚀剂,以及生产正永久抗蚀剂的方法
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Application No.: US12742557Application Date: 2008-11-12
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Publication No.: US08211619B2Publication Date: 2012-07-03
- Inventor: Hiroshi Morita , Hiromi Sato , Atsushi Kobayashi , Jinichi Omi , Seiichi Saito
- Applicant: Hiroshi Morita , Hiromi Sato , Atsushi Kobayashi , Jinichi Omi , Seiichi Saito
- Applicant Address: JP Tokyo
- Assignee: Adeka Corporation
- Current Assignee: Adeka Corporation
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP.
- Priority: JP2007-294503 20071113
- International Application: PCT/JP2008/070553 WO 20081112
- International Announcement: WO2009/063887 WO 20090522
- Main IPC: G03F7/075
- IPC: G03F7/075 ; G03F7/16 ; G03F7/20 ; G03F7/30 ; G03F7/40

Abstract:
The present invention provides: a positive photosensitive composition that yields an insulation layer superior not only in high transparency, but also in heat resistance enduring a temperature during the production of a substrate, solvent resistance, and anti-aging property as a permanent resist; a positive permanent resist utilizing the positive photosensitive composition; and a method for producing the positive permanent resist. The present invention provides: a positive photosensitive composition containing (A) a curable silicone resin having a silanol group, which resin has a structure obtained by a reaction between one or more cyclic siloxane compounds represented by the following general formula (1): and one or more arylalkoxysilane compounds represented by the following general formula (2): (B) diazonaphthoquinones, and (C) a solvent; a positive permanent resist using the positive photosensitive composition; and a method for producing the positive permanent resist.
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