Invention Grant
- Patent Title: Antireflective coating compositions
- Patent Title (中): 防反射涂料组合物
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Application No.: US12797949Application Date: 2010-06-10
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Publication No.: US08211621B2Publication Date: 2012-07-03
- Inventor: David Abdallah , Francis Houlihan , Mark Neisser
- Applicant: David Abdallah , Francis Houlihan , Mark Neisser
- Applicant Address: US NJ Somerville
- Assignee: AZ Electronic Materials USA Corp.
- Current Assignee: AZ Electronic Materials USA Corp.
- Current Assignee Address: US NJ Somerville
- Agent Sangya Jain
- Main IPC: G03F7/30
- IPC: G03F7/30 ; G03F7/11 ; C08L63/00 ; C08L67/00
Abstract:
The present invention discloses novel bottom anti-reflective coating compositions where a coating from the composition has an etch rate that can be regulated by the etch plate temperature.
Public/Granted literature
- US20100248137A1 Antireflective Coating Compositons Public/Granted day:2010-09-30
Information query
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