Invention Grant
US08211627B2 Method and apparatus for structuring a radiation-sensitive material
有权
用于构造辐射敏感材料的方法和装置
- Patent Title: Method and apparatus for structuring a radiation-sensitive material
- Patent Title (中): 用于构造辐射敏感材料的方法和装置
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Application No.: US12345960Application Date: 2008-12-30
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Publication No.: US08211627B2Publication Date: 2012-07-03
- Inventor: Heiko Feldmann
- Applicant: Heiko Feldmann
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT GmbH
- Current Assignee: Carl Zeiss SMT GmbH
- Current Assignee Address: DE Oberkochen
- Agency: Fish & Richardson P.C.
- Priority: DE102008006438 20080128
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G02B26/08

Abstract:
A method and to an apparatus for structuring a radiation-sensitive material are disclosed. The method can include using a dynamic mask to generate a first radiation pattern in a layer of the radiation-sensitive material, where the first radiation pattern has a thickness that is at most 50% of the thickness of the layer of the radiation-sensitive material. The method can also include using the dynamic mask to generate a second radiation pattern in the layer of the radiation-sensitive material. The dynamic mask can be configured to change its structure dynamically, and the first radiation pattern can be different from the second radiation pattern.
Public/Granted literature
- US20090191490A1 METHOD AND APPARATUS FOR STRUCTURING A RADIATION-SENSITIVE MATERIAL Public/Granted day:2009-07-30
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