Invention Grant
US08211627B2 Method and apparatus for structuring a radiation-sensitive material 有权
用于构造辐射敏感材料的方法和装置

Method and apparatus for structuring a radiation-sensitive material
Abstract:
A method and to an apparatus for structuring a radiation-sensitive material are disclosed. The method can include using a dynamic mask to generate a first radiation pattern in a layer of the radiation-sensitive material, where the first radiation pattern has a thickness that is at most 50% of the thickness of the layer of the radiation-sensitive material. The method can also include using the dynamic mask to generate a second radiation pattern in the layer of the radiation-sensitive material. The dynamic mask can be configured to change its structure dynamically, and the first radiation pattern can be different from the second radiation pattern.
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