Invention Grant
- Patent Title: Methods for making quasi-vertical light emitting diodes
- Patent Title (中): 制造准垂直发光二极管的方法
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Application No.: US13074807Application Date: 2011-03-29
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Publication No.: US08211721B2Publication Date: 2012-07-03
- Inventor: Limin Lin , Hung Shen Chu , Ka Wah Chan
- Applicant: Limin Lin , Hung Shen Chu , Ka Wah Chan
- Applicant Address: CN Hong Kong
- Assignee: Hong Kong Applied Science and Technology Research Institute Co. Ltd.
- Current Assignee: Hong Kong Applied Science and Technology Research Institute Co. Ltd.
- Current Assignee Address: CN Hong Kong
- Agency: Brooks Kushman P.C.
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A method of making quasi-vertical light emitting devices includes growing semiconductor layers on a growth substrate and etching the semiconductor layers to produce device isolation trenches forming separable semiconductor devices and holes. Blind holes are drilled in the substrate at the location of each of the holes in the semiconductor layers. The drilling of the blind holes defines blind hole walls and a blind hole end in each of the blind holes. N-semiconductor metal is deposited in each of the blind holes. An n-electrode contact is formed in each of the blind holes by plating each of the blind holes with an n-electrode metal connected to the n-semiconductor metal. The substrate is thinned to expose the n-electrode metal as an n-electrode. Bonding metal is deposited to the n-electrode for packaging.
Public/Granted literature
- US20110169023A1 METHODS FOR MAKING QUASI-VERTICAL LIGHT EMITTING DIODES Public/Granted day:2011-07-14
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