Invention Grant
- Patent Title: Ablation of film stacks in solar cell fabrication processes
- Patent Title (中): 在太阳能电池制造工艺中消除薄膜叠层
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Application No.: US12795526Application Date: 2010-06-07
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Publication No.: US08211731B2Publication Date: 2012-07-03
- Inventor: Gabriel Harley , Taeseok Kim , Peter John Cousins
- Applicant: Gabriel Harley , Taeseok Kim , Peter John Cousins
- Applicant Address: US CA San Jose
- Assignee: SunPower Corporation
- Current Assignee: SunPower Corporation
- Current Assignee Address: US CA San Jose
- Agency: Okamoto & Benedicto LLP
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A dielectric film stack of a solar cell is ablated using a laser. The dielectric film stack includes a layer that is absorptive in a wavelength of operation of the laser source. The laser source, which fires laser pulses at a pulse repetition rate, is configured to ablate the film stack to expose an underlying layer of material. The laser source may be configured to fire a burst of two laser pulses or a single temporally asymmetric laser pulse within a single pulse repetition to achieve complete ablation in a single step.
Public/Granted literature
- US20110300665A1 Ablation Of Film Stacks In Solar Cell Fabrication Processes Public/Granted day:2011-12-08
Information query
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