Invention Grant
- Patent Title: Polycrystalline silicon solar cell having high efficiency and method for fabricating the same
- Patent Title (中): 具有高效率的多晶硅太阳能电池及其制造方法
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Application No.: US12355078Application Date: 2009-01-16
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Publication No.: US08211738B2Publication Date: 2012-07-03
- Inventor: Seung Ki Joo , Hyeong Suk Yoo , Young Su Kim
- Applicant: Seung Ki Joo , Hyeong Suk Yoo , Young Su Kim
- Applicant Address: KR Seoul
- Assignee: SNU R&DB Foundation
- Current Assignee: SNU R&DB Foundation
- Current Assignee Address: KR Seoul
- Agency: Rosenberg, Klein & Lee
- Priority: KR10-2008-0004835 20080116
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
Disclosed herein is a method of forming a light-absorbing layer of a polycrystalline silicon solar cell, including: forming a polycrystalline silicon layer on a back electrode; forming an intrinsic amorphous silicon layer on the polycrystalline silicon layer; and heat-treating the transparent insulating substrate to vertically crystallize the intrinsic amorphous silicon layer using the polycrystalline silicon layer as a seed for crystallization through a metal induced vertical crystallization (MIVC) process to form the intrinsic amorphous silicon layer into a light-absorbing layer made of polycrystalline silicon, and is a method of fabricating a high-efficiency polycrystalline silicon solar cell using the light-absorbing layer.
Public/Granted literature
- US20090183772A1 POLYCRYSTALLINE SILICON SOLAR CELL HAVING HIGH EFFICIENCY AND METHOD FOR FABRICATING THE SAME Public/Granted day:2009-07-23
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