Invention Grant
US08211994B2 Polymers made from polyhedral oligomeric silsesquioxanes and diacetylene-containing compounds
有权
由多面体低聚倍半硅氧烷和含有乙炔的化合物制成的聚合物
- Patent Title: Polymers made from polyhedral oligomeric silsesquioxanes and diacetylene-containing compounds
- Patent Title (中): 由多面体低聚倍半硅氧烷和含有乙炔的化合物制成的聚合物
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Application No.: US13211347Application Date: 2011-08-17
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Publication No.: US08211994B2Publication Date: 2012-07-03
- Inventor: Manoj K. Kolel-Veetil , Teddy M Keller
- Applicant: Manoj K. Kolel-Veetil , Teddy M Keller
- Applicant Address: US DC Washington
- Assignee: The United States of America, as represented by the Secretary of the Navy
- Current Assignee: The United States of America, as represented by the Secretary of the Navy
- Current Assignee Address: US DC Washington
- Agent Amy L. Ressing; Joseph T. Grunkemeyer
- Main IPC: C08G77/20
- IPC: C08G77/20

Abstract:
A compound having the formula. Each R is methyl or phenyl; R2 comprises one or more of silane, siloxane, and aromatic groups; n is a nonnegative integer; and m is 1 or 2. The dashed bond is a single bond and the double dashed bond is a double bond, or the dashed bond is a double bond and the double dashed bond is a triple bond. A polymer made by a hydrosilation reaction of a polyhedral oligomeric silsesquioxane having pendant siloxane groups with an acetylene- and silicon-containing compound having at least two vinyl or ethynyl groups, and a crosslinked polymer thereof. The reaction occurs between the pendant siloxane groups and the vinyl or ethynyl groups.
Public/Granted literature
- US20110301306A1 POLYMERS MADE FROM POLYHEDRAL OLIGOMERIC SILSESQUIOXANES AND DIACETYLENE-CONTAINING COMPOUNDS Public/Granted day:2011-12-08
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