Invention Grant
- Patent Title: Charged particle beam device
- Patent Title (中): 带电粒子束装置
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Application No.: US12389838Application Date: 2009-02-20
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Publication No.: US08212224B2Publication Date: 2012-07-03
- Inventor: Akiko Fujisawa , Hiroyuki Kobayashi , Eiko Nakazawa
- Applicant: Akiko Fujisawa , Hiroyuki Kobayashi , Eiko Nakazawa
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: McDermott Will & Emery LLP
- Priority: JP2008-049002 20080229
- Main IPC: G21K5/10
- IPC: G21K5/10 ; H01J37/26

Abstract:
The present invention provides a charged particle beam device which can effectively restrain misalignment of an optical axis even if a position of an anode is changed. The present invention is a charged particle beam device comprising a cathode provided with a charged particle source which emits a charged particle, an anode which applies an electric field to the emitted charged particle, a charged particle beam deflector which deflects an orbit of a charged particle beam having passed the anode, and a charged particle beam detector which detects the charged particle beam from a sample to which the charged particle is irradiated, wherein a distance changing mechanism which changes a distance between the cathode and the anode, corresponding to a charged particle amount emitted from the charged particle source and a deflection amount control mechanism which detects a condition of the deflector under which the charged particle dose detected from the sample scanned by deflecting the charged particle beam in the changed distance becomes a desired size and controls deflection of the deflector at sample measurement on the basis of the condition are provided.
Public/Granted literature
- US20090218507A1 CHARGED PARTICLE BEAM DEVICE Public/Granted day:2009-09-03
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