Invention Grant
US08212227B2 Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus 有权
电子束曝光或系统检查或测量装置及其方法和高度检测装置

Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus
Abstract:
An electron beam apparatus equipped with a height detection system includes an electron beam unit emitting an electron beam to the specimen, and a height detection system for detecting height of the specimen which is set on a table. The height detection system includes an illumination system configured to direct first and second beams of light through a mask with a multi-slit pattern to a surface of the specimen at substantially opposite azimuth angles and at substantially equal angles of incidence, first and second detectors which respectively detect first and second multi-slit images of the first and second beams reflected from the specimen and generate output signals thereof, and a device which receives the output signals and generates a comparison signal which is responsive to the height of the specimen. An objective lens of the electron beam unit is controlled in accordance with the comparison signal.
Information query
Patent Agency Ranking
0/0