Invention Grant
- Patent Title: Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus
- Patent Title (中): 电子束曝光或系统检查或测量装置及其方法和高度检测装置
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Application No.: US12754181Application Date: 2010-04-05
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Publication No.: US08212227B2Publication Date: 2012-07-03
- Inventor: Masahiro Watanabe , Takashi Hiroi , Maki Tanaka , Hiroyuki Shinada , Yasutsugu Usami
- Applicant: Masahiro Watanabe , Takashi Hiroi , Maki Tanaka , Hiroyuki Shinada , Yasutsugu Usami
- Applicant Address: JP Tokyo
- Assignee: Hitachi, Ltd.
- Current Assignee: Hitachi, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Antonelli, Terry, Stout & Kraus, LLP.
- Priority: JP9-216604 19970811
- Main IPC: A61N5/00
- IPC: A61N5/00 ; G21G5/00

Abstract:
An electron beam apparatus equipped with a height detection system includes an electron beam unit emitting an electron beam to the specimen, and a height detection system for detecting height of the specimen which is set on a table. The height detection system includes an illumination system configured to direct first and second beams of light through a mask with a multi-slit pattern to a surface of the specimen at substantially opposite azimuth angles and at substantially equal angles of incidence, first and second detectors which respectively detect first and second multi-slit images of the first and second beams reflected from the specimen and generate output signals thereof, and a device which receives the output signals and generates a comparison signal which is responsive to the height of the specimen. An objective lens of the electron beam unit is controlled in accordance with the comparison signal.
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