Invention Grant
- Patent Title: Thin film transistor, manufacturing method thereof, and semiconductor device
- Patent Title (中): 薄膜晶体管及其制造方法以及半导体器件
-
Application No.: US11896005Application Date: 2007-08-29
-
Publication No.: US08212254B2Publication Date: 2012-07-03
- Inventor: Hidekazu Miyairi
- Applicant: Hidekazu Miyairi
- Applicant Address: JP Atsugi-shi, Kanagawa-ken
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Atsugi-shi, Kanagawa-ken
- Agency: Robinson Intellectual Property Law Office, P.C.
- Agent Eric J. Robinson
- Priority: JP2006-236105 20060831
- Main IPC: H01L29/10
- IPC: H01L29/10 ; H01L29/76 ; H01L31/036 ; H01L31/112

Abstract:
By a laser crystallization method, a crystalline semiconductor film in which grain boundaries are all in one direction is provided as well as a manufacturing method thereof. In crystallizing a semiconductor film formed over a substrate with linear laser light, a phase-shift mask in which trenches are formed in a stripe form is used. The stripe-form trenches formed in the phase-shift mask are formed so as to make a nearly perpendicular angle with a major axis direction of the linear laser light. CW laser light is used as the laser light, and a scanning direction of the laser light is nearly parallel to a direction of the stripe-form trenches (grooves). By changing luminance of the laser light periodically in the major axis direction, a crystal nucleation position in a semiconductor that is completely melted can be controlled.
Public/Granted literature
- US20080210945A1 Thin film transistor, manufacturing method thereof, and semiconductor device Public/Granted day:2008-09-04
Information query
IPC分类: