Invention Grant
US08212290B2 High temperature performance capable gallium nitride transistor 有权
耐高温性能的氮化镓晶体管

High temperature performance capable gallium nitride transistor
Abstract:
A transistor device capable of high performance at high temperatures. The transistor comprises a gate having a contact layer that contacts the active region. The gate contact layer is made of a material that has a high Schottky barrier when used in conjunction with a particular semiconductor system (e.g., Group-III nitrides) and exhibits decreased degradation when operating at high temperatures. The device may also incorporate a field plate to further increase the operating lifetime of the device.
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