Invention Grant
- Patent Title: High temperature performance capable gallium nitride transistor
- Patent Title (中): 耐高温性能的氮化镓晶体管
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Application No.: US11726975Application Date: 2007-03-23
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Publication No.: US08212290B2Publication Date: 2012-07-03
- Inventor: Sten Heikman , Yifeng Wu
- Applicant: Sten Heikman , Yifeng Wu
- Applicant Address: US CA Goleta
- Assignee: Cree, Inc.
- Current Assignee: Cree, Inc.
- Current Assignee Address: US CA Goleta
- Agency: Koppel, Patrick, Heybl & Philpott
- Main IPC: H01L31/072
- IPC: H01L31/072

Abstract:
A transistor device capable of high performance at high temperatures. The transistor comprises a gate having a contact layer that contacts the active region. The gate contact layer is made of a material that has a high Schottky barrier when used in conjunction with a particular semiconductor system (e.g., Group-III nitrides) and exhibits decreased degradation when operating at high temperatures. The device may also incorporate a field plate to further increase the operating lifetime of the device.
Public/Granted literature
- US20080230786A1 High temperature performance capable gallium nitride transistor Public/Granted day:2008-09-25
Information query
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