Invention Grant
- Patent Title: Inverse mode SiGe HBT cascode device and fabrication method
- Patent Title (中): 反模式SiGe HBT共源共栅器件及其制造方法
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Application No.: US12381345Application Date: 2009-03-11
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Publication No.: US08212291B2Publication Date: 2012-07-03
- Inventor: Tushar K. Thrivikraman , Aravind Appaswamy , John D. Cressler
- Applicant: Tushar K. Thrivikraman , Aravind Appaswamy , John D. Cressler
- Applicant Address: US GA Atlanta
- Assignee: Georgia Tech Research Corporation
- Current Assignee: Georgia Tech Research Corporation
- Current Assignee Address: US GA Atlanta
- Agency: Troutman Sanders LLP
- Agent Dustin B. Weeks, Esq.; Ryan A. Schneider, Esq.
- Main IPC: H01L29/737
- IPC: H01L29/737

Abstract:
Disclosed is a device structure using an inverse-mode cascoded Silicon-Germanium (SiGe) Heterojunction Bipolar Transistor (HBT) beneficial in applications requiring radiation hardened circuitry. The device comprises a forward-mode common-emitter HBT cascoded with a common-base inverse-mode HBT, sharing a common sub-collector. An exemplary device was measured to have over 20 dB of current gain, and over 30 dB of power gain at 10 GHz, thus demonstrating the use of these circuits for high-frequency circuit applications. In addition, the radiation response and voltage limits were characterized and showed to have negligible performance effects in typical operating conditions. Due to the unique topology, the disclosed device has the benefit of being a more compact cascode design and the additional benefit of providing significantly improved radiation tolerance.
Public/Granted literature
- US20090231034A1 Inverse mode SiGe HBT cascode device and fabrication method Public/Granted day:2009-09-17
Information query
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