Invention Grant
US08212305B2 Semiconductor device with improved insulating film and floating gate arrangement to decrease memory cell size without reduction of capacitance
有权
具有改进的绝缘膜和浮栅布置的半导体器件,以减小存储器单元尺寸而不降低电容
- Patent Title: Semiconductor device with improved insulating film and floating gate arrangement to decrease memory cell size without reduction of capacitance
- Patent Title (中): 具有改进的绝缘膜和浮栅布置的半导体器件,以减小存储器单元尺寸而不降低电容
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Application No.: US12633815Application Date: 2009-12-09
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Publication No.: US08212305B2Publication Date: 2012-07-03
- Inventor: Tatsuya Fukumura , Yoshihiro Ikeda , Shunichi Narumi , Izumi Takesue
- Applicant: Tatsuya Fukumura , Yoshihiro Ikeda , Shunichi Narumi , Izumi Takesue
- Applicant Address: JP Kanagawa
- Assignee: Renesas Electronics Corporation
- Current Assignee: Renesas Electronics Corporation
- Current Assignee Address: JP Kanagawa
- Agency: Antonelli, Terry, Stout & Kraus, LLP.
- Priority: JP2003-314648 20030905
- Main IPC: H01L29/788
- IPC: H01L29/788

Abstract:
A semiconductor device having a nonvolatile memory is reduced in size. In an AND type flash memory having a plurality of nonvolatile memory cells having a plurality of first electrodes, a plurality of word lines crossing therewith, and a plurality of floating gate electrodes disposed at positions which respectively lie between the plurality of adjacent first electrodes and overlap the plurality of word lines, as seen in plan view, the plurality of floating gate electrodes are formed in a convex shape, as seen in cross section, so as to be higher than the first electrodes. As a result, even when nonvolatile memory cells are reduced in size, it is possible to process the floating gate electrodes with ease. In addition, it is possible to improve the coupling ratio between floating gate electrodes and control gate electrodes of the word lines without increasing the area occupied by the nonvolatile memory cells.
Public/Granted literature
- US20100084701A1 SEMICONDUCTOR DEVICE AND A METHOD OF MANUFACTURING THE SAME Public/Granted day:2010-04-08
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