Invention Grant
- Patent Title: Nonvolatile semiconductor flash memory
- Patent Title (中): 非易失性半导体闪存
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Application No.: US12618058Application Date: 2009-11-13
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Publication No.: US08212308B2Publication Date: 2012-07-03
- Inventor: Kiyohito Nishihara , Fumitaka Arai
- Applicant: Kiyohito Nishihara , Fumitaka Arai
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2008-298533 20081121
- Main IPC: H01L29/788
- IPC: H01L29/788

Abstract:
Two diffusion layers are provided in an element area. A tunnel insulating film is provided on the surface of the element area between the two diffusion layers. A charge storage layer is provided on the tunnel insulating film. A first insulator provided on the upper surface of the charge storage layer. An inter-electrode insulating film provided on the first insulator, on the side surface of the charge storage layer in a first direction and on the isolation insulating film. And a control gate electrode extends in the first direction and covers the charge storage layer via the first insulator and the inter-electrode insulating film. The first insulator is thicker than the inter-electrode insulating film, and the inter-electrode insulating film has a first slit on the first insulator.
Public/Granted literature
- US20100127320A1 NONVOLATILE SEMICONDUCTOR MEMORY Public/Granted day:2010-05-27
Information query
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