Invention Grant
US08212318B2 High-voltage transistor with improved high stride performance 有权
具有改进的高步幅性能的高压晶体管

High-voltage transistor with improved high stride performance
Abstract:
A high voltage NMOS transistor is disclosed where the p-doped body is isolated against the p-doped substrate by a DN well having a pinch-off region where the depth of the DN-well is at minimum. By the forming space charge region at raising drain potentials a shielding of the drain potential results because the space charge region touches the field oxide between source and drain at the pinch-off region. An operation at the high side at enhanced voltage levels is possible.
Public/Granted literature
Information query
Patent Agency Ranking
0/0