Invention Grant
- Patent Title: High-voltage transistor with improved high stride performance
- Patent Title (中): 具有改进的高步幅性能的高压晶体管
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Application No.: US12299741Application Date: 2007-04-16
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Publication No.: US08212318B2Publication Date: 2012-07-03
- Inventor: Martin Knaipp , Georg Röhrer , Jong Mun Park
- Applicant: Martin Knaipp , Georg Röhrer , Jong Mun Park
- Applicant Address: AT Unterpremstätten
- Assignee: austriamicrosystems AG
- Current Assignee: austriamicrosystems AG
- Current Assignee Address: AT Unterpremstätten
- Agency: Cozen O'Connor
- Priority: EP06009366 20060505
- International Application: PCT/EP2007/003338 WO 20070416
- International Announcement: WO2007/128383 WO 20071115
- Main IPC: H01L29/66
- IPC: H01L29/66

Abstract:
A high voltage NMOS transistor is disclosed where the p-doped body is isolated against the p-doped substrate by a DN well having a pinch-off region where the depth of the DN-well is at minimum. By the forming space charge region at raising drain potentials a shielding of the drain potential results because the space charge region touches the field oxide between source and drain at the pinch-off region. An operation at the high side at enhanced voltage levels is possible.
Public/Granted literature
- US20090321822A1 HIGH-VOLTAGE TRANSISTOR WITH IMPROVED HIGH STRIDE PERFORMANCE Public/Granted day:2009-12-31
Information query
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