Invention Grant
- Patent Title: Short channel lateral MOSFET and method
- Patent Title (中): 短沟横向MOSFET及方法
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Application No.: US12941044Application Date: 2010-11-06
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Publication No.: US08212329B2Publication Date: 2012-07-03
- Inventor: Shekar Mallikarjunaswamy , Amit Paul
- Applicant: Shekar Mallikarjunaswamy , Amit Paul
- Applicant Address: US CA Sunnyvale
- Assignee: Alpha and Omega Semiconductor Inc.
- Current Assignee: Alpha and Omega Semiconductor Inc.
- Current Assignee Address: US CA Sunnyvale
- Agency: Chemily LLC
- Agent Chein-Hwa Tsao
- Main IPC: H01L23/58
- IPC: H01L23/58 ; H01L29/66

Abstract:
A short channel Lateral MOSFET (LMOS) and method are disclosed with interpenetrating drain-body protrusions (IDBP) for reducing channel-on resistance while maintaining high punch-through voltage. The LMOS includes lower device bulk layer; upper source and upper drain region both located atop lower device bulk layer; both upper source and upper drain region are in contact with an intervening upper body region atop lower device bulk layer; both upper drain and upper body region are shaped to form a drain-body interface; the drain-body interface has an IDBP structure with a surface drain protrusion lying atop a buried body protrusion while revealing a top body surface area of the upper body region; gate oxide-gate electrode bi-layer disposed atop the upper body region forming an LMOS with a short channel length defined by the horizontal length of the top body surface area delineated between the upper source region and the upper drain region.
Public/Granted literature
- US20110049623A1 Short Channel Lateral MOSFET and Method Public/Granted day:2011-03-03
Information query
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