Invention Grant
US08212989B2 Device for transferring structures which are provided in a mask onto a substrate
有权
用于将设置在掩模中的结构转印到基板上的装置
- Patent Title: Device for transferring structures which are provided in a mask onto a substrate
- Patent Title (中): 用于将设置在掩模中的结构转印到基板上的装置
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Application No.: US12115587Application Date: 2008-05-06
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Publication No.: US08212989B2Publication Date: 2012-07-03
- Inventor: Erich Thallner
- Applicant: Erich Thallner
- Agency: Kusner & Jaffe
- Priority: DE102007022895 20070514
- Main IPC: G03B27/42
- IPC: G03B27/42

Abstract:
The invention concerns a device for transferring structures which are provided in a mask onto a substrate, with at least one illumination device, for homogeneous illumination of a section of the mask, and with a mask holding device, for holding a mask in a mask plane which is defined by an X axis and a Y axis which is perpendicular to it, and with at least one lens device, which is arranged on the side of the mask plane facing away from the illumination device, for mapping the structures onto the substrate, and with a substrate holding device, for holding the substrate in a substrate plane which is parallel to the mask plane and at a distance from the lens device, and with means for synchronous movement of the illumination device and lens device in parallel, relative to the mask plane and substrate plane, along the X axis and/or along the Y axis.
Public/Granted literature
- US20080284999A1 DEVICE FOR TRANSFERRING STRUCTURES WHICH ARE PROVIDED IN A MASK ONTO A SUBSTRATE Public/Granted day:2008-11-20
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