Invention Grant
- Patent Title: Integrated flow cell with semiconductor oxide tubing
- Patent Title (中): 集成流通池与半导体氧化物管
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Application No.: US12237398Application Date: 2008-09-25
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Publication No.: US08213015B2Publication Date: 2012-07-03
- Inventor: Karsten Kraizcek , Beno Mueller , Timothy Beerling
- Applicant: Karsten Kraizcek , Beno Mueller , Timothy Beerling
- Applicant Address: US CA Santa Clara
- Assignee: Agilent Technologies, Inc.
- Current Assignee: Agilent Technologies, Inc.
- Current Assignee Address: US CA Santa Clara
- Main IPC: G01N21/00
- IPC: G01N21/00
Abstract:
An integrated flow cell, the flow cell comprising a semiconductor substrate, and a fluidic conduit having an at least partially transparent semiconductor oxide tubing, wherein the semiconductor oxide tubing is formed with the semiconductor substrate.
Public/Granted literature
- US20100277722A1 INTEGRATED FLOW CELL WITH SEMICONDUCTOR OXIDE TUBING Public/Granted day:2010-11-04
Information query
