Invention Grant
- Patent Title: Coating composition for antireflection with resistance and antireflection characteristic and antireflection film prepared by using the same
- Patent Title (中): 用于具有电阻和抗反射特性的抗反射涂料组合物和使用其制备的抗反射膜
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Application No.: US12448589Application Date: 2007-12-28
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Publication No.: US08213086B2Publication Date: 2012-07-03
- Inventor: Yeong-Rae Chang , Young-Jun Hong , Young-Eun Lee , Tae-Su Kim , Hyun-Woo Shin , Bu-Gon Shin
- Applicant: Yeong-Rae Chang , Young-Jun Hong , Young-Eun Lee , Tae-Su Kim , Hyun-Woo Shin , Bu-Gon Shin
- Applicant Address: KR Seoul
- Assignee: LG Chem, Ltd.
- Current Assignee: LG Chem, Ltd.
- Current Assignee Address: KR Seoul
- Agency: McKenna Long & Aldridge LLP
- Priority: KR10-2006-0137601 20061229
- International Application: PCT/KR2007/006917 WO 20071228
- International Announcement: WO2008/082168 WO 20080710
- Main IPC: G02B1/10
- IPC: G02B1/10

Abstract:
A coating composition for antireflection that includes a low refraction-thermosetting resin having a refractive index of 1.2 to 1.45, a high refraction-ultraviolet curable resin having a refractive index of 1.46 to 2, and an ultraviolet absorber; an antireflection film manufactured using the coating composition; and a method of manufacturing the antireflection film. The antireflection film has excellent abrasion resistance and antireflection characteristic. Further, since the antireflection film can be manufactured in one coating process, it is possible to reduce manufacturing cost.
Public/Granted literature
- US20090296219A1 COATING COMPOSITION FOR ANTIREFLECTION AND ANTIREFLECTION FILM PREPARED BY USING THE SAME Public/Granted day:2009-12-03
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