Invention Grant
- Patent Title: Semiconductor laser and method of manufacturing the same
- Patent Title (中): 半导体激光器及其制造方法
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Application No.: US12705275Application Date: 2010-02-12
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Publication No.: US08213477B2Publication Date: 2012-07-03
- Inventor: Ryuji Kobayashi
- Applicant: Ryuji Kobayashi
- Applicant Address: JP Kanagawa
- Assignee: Renesas Electronics Corporation
- Current Assignee: Renesas Electronics Corporation
- Current Assignee Address: JP Kanagawa
- Agency: Sughrue Mion, PLLC
- Priority: JP2009-029124 20090210
- Main IPC: H01S5/00
- IPC: H01S5/00

Abstract:
Provided is a semiconductor laser including: a substrate (semiconductor substrate); an optical waveguide (active layer waveguide) with a mesa structure that includes an active layer (strain-compensated multiple quantum well active layer) including Al, is provided over the semiconductor substrate; a semiconductor protective layer that is provided so as to cover the top and the side of a mesa of the active layer waveguide; a current block layer that is provided so as to embed the active layer waveguide and the semiconductor protective layer; and a clad layer (p-type InP clad layer) that is provided over the semiconductor protective layer and the current block layer, wherein, the semiconductor protective layer has a semiconductor layer (p-type InGaAsP protective layer) that includes As, but does not include Al.
Public/Granted literature
- US20100202485A1 SEMICONDUCTOR LASER AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2010-08-12
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