Invention Grant
US08214916B2 Large area, homogeneous array fabrication including leveling with use of bright spots
失效
大面积，均匀的阵列制造，包括使用亮点的流平
- Patent Title: Large area, homogeneous array fabrication including leveling with use of bright spots
- Patent Title (中): 大面积，均匀的阵列制造，包括使用亮点的流平
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Application No.: US12656312Application Date: 2010-01-25
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Publication No.: US08214916B2Publication Date: 2012-07-03
- Inventor: Nabil A. Amro , Raymond Sanedrin
- Applicant: Nabil A. Amro , Raymond Sanedrin
- Applicant Address: US IL Skokie
- Assignee: NanoInk, Inc.
- Current Assignee: NanoInk, Inc.
- Current Assignee Address: US IL Skokie
- Agency: Foley & Lardner LLP
- Main IPC: G01Q20/02
- IPC: G01Q20/02
Abstract:
Better leveling procedures for patterning at the small scale including the nanoscale. A method comprising: providing at least one array of cantilevers comprising tips thereon, wherein the cantilevers comprise at least one relatively bright spot, or at least two relatively bright spots, near the tip upon viewing, providing a substrate, leveling the array and the substrate with respect to each other, wherein the relatively bright spot near the tip is viewed to determine a contact of the tip and substrate.
Public/Granted literature
- US20100251439A1 Large area, homogeneous array fabrication including leveling with use of bright spots Public/Granted day:2010-09-30
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