Invention Grant
- Patent Title: Insulating film, process for producing the same and electronic device using the same
- Patent Title (中): 绝缘膜，其制造方法和使用其的电子器件
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Application No.: US12914471Application Date: 2010-10-28
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Publication No.: US08216647B2Publication Date: 2012-07-10
- Inventor: Yutaka Adegawa
- Applicant: Yutaka Adegawa
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2005-071073 20050314
- Main IPC: H01L21/31
- IPC: H01L21/31
Abstract:
An insulating film formed by a method comprising: coating a film-forming composition containing a compound having a cage structure; and drying the coated composition, wherein the coated composition is irradiated with a light having a wavelength of 200 nm or less in at least one of during the drying and after the drying; a process for producing the same; and an electronic device having the same.
Public/Granted literature
- US20110039037A1 INSULATING FILM, PROCESS FOR PRODUCING THE SAME AND ELECTRONIC DEVICE USING THE SAME Public/Granted day:2011-02-17
Information query
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