Invention Grant
- Patent Title: Photoacid generator and photoreactive composition
- Patent Title (中): 光酸发生剂和光反应性组合物
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Application No.: US12741325Application Date: 2008-10-30
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Publication No.: US08216768B2Publication Date: 2012-07-10
- Inventor: Katsumasa Yamamoto , Hirofumi Yamaguchi , Michio Suzuki
- Applicant: Katsumasa Yamamoto , Hirofumi Yamaguchi , Michio Suzuki
- Applicant Address: JP Kako-gun
- Assignee: Sumitomo Seika Chemicals Co., Ltd.
- Current Assignee: Sumitomo Seika Chemicals Co., Ltd.
- Current Assignee Address: JP Kako-gun
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: JP2007-307632 20071128; JP2007-307633 20071128; JP2007-307634 20071128
- International Application: PCT/JP2008/069783 WO 20081030
- International Announcement: WO2009/069428 WO 20090604
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/028 ; C07D409/12
Abstract:
A photoacid generator, which shows very high sensitivity in the near ultraviolet range of about 300 to 400 nm, and also can remarkably increase a reaction rate of a photoreactive composition using the same, and a photoreactive composition which can initiate the reaction even by irradiation with near ultraviolet light within a short time and also can obtain a desired reaction product. A dithienyl sulfide disulfonium salt represented by the formula (A1): a dithienyl sulfide sulfonium salt represented by the formula (B1): and a phenylthiothiophene sulfonium salt represented by the formula (C1):
Public/Granted literature
- US20100233621A1 PHOTOACID GENERATOR AND PHOTOREACTIVE COMPOSITION Public/Granted day:2010-09-16
Information query
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