Invention Grant
- Patent Title: Back-illuminated type imaging device and fabrication method thereof
- Patent Title (中): 背照式成像装置及其制造方法
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Application No.: US13100475Application Date: 2011-05-04
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Publication No.: US08216873B2Publication Date: 2012-07-10
- Inventor: Shinji Uya
- Applicant: Shinji Uya
- Applicant Address: JP Tokyo
- Assignee: Fujifilm Corporation
- Current Assignee: Fujifilm Corporation
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JPP2007-157460 20070614
- Main IPC: H01L21/28
- IPC: H01L21/28

Abstract:
Light is illuminated from a back-surface side of a silicon substrate 4. A back-illuminated type imaging device 100 reads out, from a front-surface side of the silicon substrate 4, charges that are generated in the silicon substrate 4 in response to the illuminated light, so as to perform imaging. The back-illuminated type imaging device 100 includes pad portions 17 formed on the back surface of the semiconductor substrate 4, and a plurality of pillars 9 that are formed in the semiconductor substrate 4, are made of a conductive material and electrically connect wiring portions 12 formed on the front surface of the semiconductor substrate 4 and the pad portions 17 to each other.
Public/Granted literature
- US20110207250A1 BACK-ILLUMINATED TYPE IMAGING DEVICE AND FABRICATION METHOD THEREOF Public/Granted day:2011-08-25
Information query
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