Invention Grant
- Patent Title: Method of manufacturing superconducting thin film material, superconducting device and superconducting thin film material
- Patent Title (中): 制造超导薄膜材料的方法,超导器件和超导薄膜材料
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Application No.: US12278369Application Date: 2007-01-17
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Publication No.: US08216979B2Publication Date: 2012-07-10
- Inventor: Shuji Hahakura , Kazuya Ohmatsu , Munetsugu Ueyama , Katsuya Hasegawa
- Applicant: Shuji Hahakura , Kazuya Ohmatsu , Munetsugu Ueyama , Katsuya Hasegawa
- Applicant Address: JP Osaka-shi, Osaka JP Koto-ku, Tokyo
- Assignee: Sumitomo Electric Industries, Ltd.,International Superconducticvity Technology Center
- Current Assignee: Sumitomo Electric Industries, Ltd.,International Superconducticvity Technology Center
- Current Assignee Address: JP Osaka-shi, Osaka JP Koto-ku, Tokyo
- Agency: Drinker Biddle & Reath LLP
- Priority: JP2006-039395 20060216
- International Application: PCT/JP2007/050592 WO 20070117
- International Announcement: WO2007/094146 WO 20070823
- Main IPC: B05D5/12
- IPC: B05D5/12 ; H01B12/00 ; H01L39/24

Abstract:
A method of manufacturing a superconducting thin film material includes a vapor phase step of forming a superconducting layer by a vapor phase method and a liquid phase step of forming a superconducting layer by a liquid phase method so that the latter superconducting layer is in contact with the former superconducting layer. Preferably, the method further includes the step of forming an intermediate layer between the former superconducting layer and a metal substrate. The metal substrate is made of a metal, and preferably the intermediate layer is made of an oxide having a crystal structure of any of rock type, perovskite type and pyrochlore type, and the former superconducting layer and the latter superconducting layer both have an RE123 composition. Accordingly, the critical current value can be improved.
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