Invention Grant
- Patent Title: Reducing back-reflections in laser processing systems
- Patent Title (中): 减少激光加工系统中的反射反射
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Application No.: US12209959Application Date: 2008-09-12
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Publication No.: US08217302B2Publication Date: 2012-07-10
- Inventor: Mehmet E. Alpay , Brian Johansen
- Applicant: Mehmet E. Alpay , Brian Johansen
- Applicant Address: US OR Portland
- Assignee: Electro Scientific Industries, Inc
- Current Assignee: Electro Scientific Industries, Inc
- Current Assignee Address: US OR Portland
- Agency: Stoel Rives LLP
- Main IPC: B23K26/00
- IPC: B23K26/00 ; B23K26/14

Abstract:
Systems and methods reduce or prevent back-reflections in a laser processing system. A laser processing system includes a laser source to generate an incident laser beam, a laser beam output to direct the incident laser beam toward a work surface, and a lens to receive the incident laser beam along a first axis of propagation that is substantially perpendicular to the work surface. The lens includes a primary axis that is substantially parallel to, and offset from, the first axis of propagation. The lens is configured to focus the incident laser beam onto the work surface along a second axis of propagation that forms a non-perpendicular angle with the work surface such that at least a substantial portion of a reflected laser beam from the work surface does not return to the laser beam output.
Public/Granted literature
- US20090308852A1 REDUCING BACK-REFLECTIONS IN LASER PROCESSING SYSTEMS Public/Granted day:2009-12-17
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