Invention Grant
- Patent Title: Semiconductor device that can adjust substrate voltage
- Patent Title (中): 可调整衬底电压的半导体器件
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Application No.: US12647259Application Date: 2009-12-24
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Publication No.: US08217712B2Publication Date: 2012-07-10
- Inventor: Shinichi Miyatake , Seiji Narui , Hitoshi Tanaka
- Applicant: Shinichi Miyatake , Seiji Narui , Hitoshi Tanaka
- Applicant Address: JP Tokyo
- Assignee: Elpida Memory, Inc.
- Current Assignee: Elpida Memory, Inc.
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2008-331209 20081225
- Main IPC: G05F1/10
- IPC: G05F1/10 ; G05F3/02

Abstract:
To provide a semiconductor device including: a MOS transistor formed in a semiconductor substrate and have a threshold voltage to be adjusted, a replica transistor of the MOS transistor, a monitoring circuit monitors a gate/source voltage needed when the replica transistor flows a current having a given designed value, a negative voltage pumping circuit generates a substrate voltage of the MOS transistor, based on an output from the monitoring circuit, and a limiting circuit defines the operation of the negative voltage pumping circuit, regardless of a monitoring result of the monitoring circuit, in response to an excess of the substrate voltage with respect to a predetermined value.
Public/Granted literature
- US20100164607A1 SEMICONDUCTOR DEVICE THAT CAN ADJUST SUBSTRATE VOLTAGE Public/Granted day:2010-07-01
Information query
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