Invention Grant
US08218125B2 Immersion lithographic apparatus with a projection system having an isolated or movable part
有权
浸没式光刻设备,其具有具有隔离或可移动部件的投影系统
- Patent Title: Immersion lithographic apparatus with a projection system having an isolated or movable part
- Patent Title (中): 浸没式光刻设备,其具有具有隔离或可移动部件的投影系统
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Application No.: US12340237Application Date: 2008-12-19
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Publication No.: US08218125B2Publication Date: 2012-07-10
- Inventor: Johannes Catharinus Hubertus Mulkens
- Applicant: Johannes Catharinus Hubertus Mulkens
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbur Winthrop Shaw Pittman LLP
- Priority: EP03254699 20030728
- Main IPC: G03B27/68
- IPC: G03B27/68

Abstract:
A lithographic projection apparatus is disclosed where at least part of a space between a projection system of the apparatus and a substrate is filled with a liquid by a liquid supply system. The projection system is separated into two separate physical parts. With substantially no direct connection between the two parts of the projection system, vibrations induced in a first of the two parts by coupling of forces through the liquid filling the space when the substrate moves relative to the liquid supply system affects substantially only the first part of the projection system and not the other second part.
Public/Granted literature
- US20090201476A1 LITHOGRAPHIC PROJECTION APPARATUS AND DEVICE MANUFACTURING METHOD Public/Granted day:2009-08-13
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