Invention Grant
US08218352B2 Semiconductor device including memory having nodes connected with continuous diffusion layer but isolated from each other by transistor
失效
半导体器件包括具有与连续扩散层连接但具有由晶体管隔离的节点的存储器
- Patent Title: Semiconductor device including memory having nodes connected with continuous diffusion layer but isolated from each other by transistor
- Patent Title (中): 半导体器件包括具有与连续扩散层连接但具有由晶体管隔离的节点的存储器
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Application No.: US12923745Application Date: 2010-10-06
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Publication No.: US08218352B2Publication Date: 2012-07-10
- Inventor: Shinobu Asayama
- Applicant: Shinobu Asayama
- Applicant Address: JP Kawasaki-shi, Kanagawa
- Assignee: Renesas Electronics Corporation
- Current Assignee: Renesas Electronics Corporation
- Current Assignee Address: JP Kawasaki-shi, Kanagawa
- Agency: McGinn IP Law Group, PLLC
- Priority: JP2007-232676 20070907
- Main IPC: G11C11/00
- IPC: G11C11/00

Abstract:
A semiconductor device includes a memory cell which includes a first inverter and a second inverter, the first inverter includes a first drive transistor and a first load transistor, the second inverter includes a second drive transistor and a second load transistor, and an input terminal and an output terminal thereof, respectively, connected to an input terminal and an output terminal of the first inverter, a first transmission transistor provided between the output terminal of the first inverter and a line of a first bit line pair, a second transmission transistor provided between the output terminal of the second inverter and another line of the first bit line pair, a third transmission transistor provided between the output terminal of the first inverter and a line of a second bit line pair, a fourth transmission transistor provided between the output terminal of the second inverter and another line of the second bit line pair, and a first isolation transistor which isolates the second drive transistor and the first transmission transistor. A first active region in which the first transmission transistor, the second transmission transistor, the second drive transistor, and the first isolation transistor are formed, is formed in a continuous region. The first isolation transistor is provided between the second drive transistor and the first transmission transistor.
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