Invention Grant
- Patent Title: Enhanced planarity in GaN edge emitting lasers
- Patent Title (中): GaN边缘发射激光器的增强平面度
-
Application No.: US12789956Application Date: 2010-05-28
-
Publication No.: US08218595B2Publication Date: 2012-07-10
- Inventor: Rajaram Bhat
- Applicant: Rajaram Bhat
- Applicant Address: US NY Corning
- Assignee: Corning Incorporated
- Current Assignee: Corning Incorporated
- Current Assignee Address: US NY Corning
- Agent Bruce P. Watson
- Main IPC: H01S5/00
- IPC: H01S5/00

Abstract:
A GaN edge emitting laser is provided comprising a semi-polar GaN substrate, an active region, an N-side waveguiding layer, a P-side waveguiding layer, an N-type cladding layer, and a P-type cladding layer. The GaN substrate defines a 20 21 crystal growth plane and a glide plane. The N-side and P-side waveguiding layers comprise a GaInN/GaN or GaInN/GaInN superlattice (SL) waveguiding layers. The superlattice layers of the N-side and P-side SL waveguiding layers define respective layer thicknesses that are optimized for waveguide planarity, the layer thicknesses being between approximately 1 nm and approximately 5 nm. In accordance with another embodiment of the present disclosure, planarization can be enhanced by ensuring that the N-side and P-side GaN-based waveguiding layers are grown at a growth rate that exceeds approximately 0.09 nm/s, regardless of whether the N-side and P-side GaN-based waveguiding layers are provided as a GaInN/GaN or GaInN/GaInN SL or as bulk waveguiding layers. In still further embodiments, planarization can be enhanced by selecting optimal SL layer thicknesses and growth rates. Additional embodiments are disclosed and claimed.
Public/Granted literature
- US20110292958A1 ENHANCED PLANARITY IN GaN EDGE EMITTING LASERS Public/Granted day:2011-12-01
Information query