Invention Grant
- Patent Title: Temperature control apparatus, processing apparatus, and temperature control method
- Patent Title (中): 温度控制装置,处理装置和温度控制方法
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Application No.: US12075987Application Date: 2008-03-14
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Publication No.: US08219260B2Publication Date: 2012-07-10
- Inventor: Masatoshi Nomura
- Applicant: Masatoshi Nomura
- Applicant Address: JP Tokyo
- Assignee: Casio Computer Co., Ltd.
- Current Assignee: Casio Computer Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Holtz, Holtz, Goodman & Chick, PC
- Priority: JP2007-074402 20070322
- Main IPC: G05D23/00
- IPC: G05D23/00

Abstract:
A temperature control apparatus includes a resistance heater whose a resistance value changes depending on a temperature of the resistance heater; a signal generator to output a control signal having two voltage levels including a first-voltage and a second-voltage; a switching section to flow a first current through the resistance heater when the voltage level of the control signal is the first-voltage, and to flow a second current having a current value smaller than that of the first current through the resistance heater when the voltage level of the control signal is the second-voltage; and a voltage measuring instrument to measure a voltage value across the resistance heater at the time when the second current flows through the resistance heater. The signal generator controls the temperature of the resistance heater based on the voltage value measured by the voltage measuring instrument.
Public/Granted literature
- US20080234875A1 Temperature control apparatus, processing apparatus, and temperature control method Public/Granted day:2008-09-25
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