Invention Grant
US08219961B2 Method for compensation of process-induced performance variation in a MOSFET integrated circuit
有权
MOSFET集成电路中过程引起的性能变化的补偿方法
- Patent Title: Method for compensation of process-induced performance variation in a MOSFET integrated circuit
- Patent Title (中): MOSFET集成电路中过程引起的性能变化的补偿方法
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Application No.: US13112837Application Date: 2011-05-20
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Publication No.: US08219961B2Publication Date: 2012-07-10
- Inventor: Victor Moroz , Dipankar Pramanik , Kishore Singhal , Xi-Wei Lin
- Applicant: Victor Moroz , Dipankar Pramanik , Kishore Singhal , Xi-Wei Lin
- Applicant Address: US CA Mountain View
- Assignee: Synopsys, Inc.
- Current Assignee: Synopsys, Inc.
- Current Assignee Address: US CA Mountain View
- Agency: Haynes Beffel & Wolfeld LLP
- Agent Kenta Suzue
- Main IPC: G06F9/455
- IPC: G06F9/455 ; G06F17/50 ; G06F11/22

Abstract:
An automated method for compensating for process-induced variations in threshold voltage and drive current in a MOSFET integrated circuit. The method's first step is selecting a transistor for analysis from the array. The method loops among the transistors of the array as desired. Next the design of the selected transistor is analyzed, including the steps of determining threshold voltage variations induced by layout neighborhood; determining drive current variations induced by layout neighborhood. The method then proceeds by attempting to compensate for any determined variations by varying the length of the transistor gate. The method can further include the step of identifying any shortcoming in compensation by varying contact spacing.
Public/Granted literature
- US20110219351A1 Method for Compensation of Process-Induced Performance Variation in a Mosfet Integrated Circuit Public/Granted day:2011-09-08
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