Invention Grant
- Patent Title: Lift-off patterning processes employing energetically-stimulated local removal of solid-condensed-gas layers
- Patent Title (中): 采用能量激励局部去除固体冷凝气体层的剥离图案化工艺
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Application No.: US12381502Application Date: 2009-03-12
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Publication No.: US08221595B2Publication Date: 2012-07-17
- Inventor: Daniel Branton , Jene A Golovchenko , Gavin M King , Warren J MoberlyChan , Gregor M Schurmann
- Applicant: Daniel Branton , Jene A Golovchenko , Gavin M King , Warren J MoberlyChan , Gregor M Schurmann
- Applicant Address: US MA Cambridge
- Assignee: President and Fellows of Harvard College
- Current Assignee: President and Fellows of Harvard College
- Current Assignee Address: US MA Cambridge
- Agent Theresa A. Lober
- Main IPC: C23C14/34
- IPC: C23C14/34
Abstract:
The invention provides a method for forming a patterned material layer on a structure, by condensing a vapor to a solid condensate layer on a surface of the structure and then localized removal of selected regions of the condensate layer by directing an ion beam at the selected regions, exposing the structure at the selected regions. A material layer is then deposited on top of the solid condensate layer and the exposed structure at the selected regions. Then the solid condensate layer and regions of the material layer that were deposited on the solid condensate layer are removed, leaving a patterned material layer on the structure.
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