Invention Grant
US08221853B2 Microwave plasma CVD of NANO structured tin/carbon composites
有权
NANO结构锡/碳复合材料的微波等离子体CVD
- Patent Title: Microwave plasma CVD of NANO structured tin/carbon composites
- Patent Title (中): NANO结构锡/碳复合材料的微波等离子体CVD
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Application No.: US12549716Application Date: 2009-08-28
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Publication No.: US08221853B2Publication Date: 2012-07-17
- Inventor: Marek Marcinek , Robert Kostecki
- Applicant: Marek Marcinek , Robert Kostecki
- Applicant Address: US CA Oakland
- Assignee: The Regents of the University of California
- Current Assignee: The Regents of the University of California
- Current Assignee Address: US CA Oakland
- Agency: Lawrence Berkeley National Laboratory
- Agent Stuart B. Chinn
- Main IPC: H05H1/24
- IPC: H05H1/24 ; B05D5/12
Abstract:
A method for forming a graphitic tin-carbon composite at low temperatures is described. The method involves using microwave radiation to produce a neutral gas plasma in a reactor cell. At least one organo tin precursor material in the reactor cell forms a tin-carbon film on a supporting substrate disposed in the cell under influence of the plasma. The three dimensional carbon matrix material with embedded tin nanoparticles can be used as an electrode in lithium-ion batteries.
Public/Granted literature
- US20100055441A1 MICROWAVE PLASMA CVD OF NANO STRUCTURED TIN/CARBON COMPOSITES Public/Granted day:2010-03-04
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