Invention Grant
- Patent Title: Pellicle frame and lithographic pellicle
- Patent Title (中): 防护薄膜组件和平版胶片
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Application No.: US12819527Application Date: 2010-06-21
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Publication No.: US08221944B2Publication Date: 2012-07-17
- Inventor: Toru Shirasaki , Kishore Chakravorty , David Mushell , Grace Ng
- Applicant: Toru Shirasaki , Kishore Chakravorty , David Mushell , Grace Ng
- Applicant Address: JP Tokyo US CA Santa Clara
- Assignee: Shin-Etsu Chemical Co., Ltd.,Intel Corporation
- Current Assignee: Shin-Etsu Chemical Co., Ltd.,Intel Corporation
- Current Assignee Address: JP Tokyo US CA Santa Clara
- Agency: Kratz, Quintos & Hanson, LLP
- Priority: JP2009-149776 20090624
- Main IPC: G03F1/62
- IPC: G03F1/62 ; G03F1/64

Abstract:
A pellicle frame is provided that comprises a pellicle frame bar having a quadrilateral cross-section, wherein an upper edge and a lower edge of a basic quadrilateral forming said cross-section are parallel to each other and each of side edges of the basic quadrilateral has one quadrilateral recess. There is also provided a lithographic pellicle that includes a pellicle film stretched over one end face of the pellicle frame via a pellicle film adhesive, and that includes an exposure master plate adhesive on the other end face.
Public/Granted literature
- US20100330466A1 PELLICLE FRAME AND LITHOGRAPHIC PELLICLE Public/Granted day:2010-12-30
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