Invention Grant
- Patent Title: Pellicle frame and lithographic pellicle
- Patent Title (中): 防护薄膜组件和平版胶片
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Application No.: US12819536Application Date: 2010-06-21
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Publication No.: US08221945B2Publication Date: 2012-07-17
- Inventor: Toru Shirasaki , Kishore Chakravorty , David Mushell , Grace Ng
- Applicant: Toru Shirasaki , Kishore Chakravorty , David Mushell , Grace Ng
- Applicant Address: JP Tokyo US CA Santa Clara
- Assignee: Shin-Etsu Chemical Co., Ltd.,Intel Corporation
- Current Assignee: Shin-Etsu Chemical Co., Ltd.,Intel Corporation
- Current Assignee Address: JP Tokyo US CA Santa Clara
- Agency: Kratz, Quintos & Hanson, LLP
- Priority: JP2009-149777 20090624
- Main IPC: G03F1/62
- IPC: G03F1/62 ; G03F1/64
Abstract:
A pellicle frame is provided that includes a pellicle frame bar having a cross-section with a shape that has a curved line-containing recess in at least one side edge of a quadrilateral having an upper edge and a lower edge parallel to each other and an area of no greater than 20 mm2.
Public/Granted literature
- US20100330467A1 PELLICLE FRAME AND LITHOGRAPHIC PELLICLE Public/Granted day:2010-12-30
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