Invention Grant
- Patent Title: Method for producing fine structure
- Patent Title (中): 生产精细结构的方法
-
Application No.: US12342147Application Date: 2008-12-23
-
Publication No.: US08221963B2Publication Date: 2012-07-17
- Inventor: Jun Amako , Daisuke Sawaki
- Applicant: Jun Amako , Daisuke Sawaki
- Applicant Address: JP
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: JP2007-337900 20071227; JP2008-306721 20081201
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G02B5/18

Abstract:
A method for producing a fine structure includes: (a) forming a photosensitive film to cover a plurality of first convex portions formed in at least one surface of a substrate; (b) arranging liquid to cover the photosensitive film on the at least one surface of the substrate; (c) arranging a transparent parallel plate such that the parallel plate opposes the substrate via the liquid; (d) generating interference field by a laser beam to irradiate the interference field onto the photosensitive film via the parallel plate and the liquid; (e) removing the liquid and the parallel plate to develop the photosensitive film so as to form a photosensitive film pattern; and (f) etching the substrate using a mask of the photosensitive film pattern to form a plurality of fine convex portions smaller than the first convex portions on the at least one surface of the substrate. In the method, the liquid arranged at step (b) has a refractive index larger than 1 and equal to or smaller than a refractive index of the photosensitive film.
Public/Granted literature
- US20090170038A1 METHOD FOR PRODUCING FINE STRUCTURE Public/Granted day:2009-07-02
Information query
IPC分类: