Invention Grant
- Patent Title: Image sensor and manufacturing method for same
- Patent Title (中): 图像传感器及其制造方法相同
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Application No.: US13231389Application Date: 2011-09-13
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Publication No.: US08222069B2Publication Date: 2012-07-17
- Inventor: Sang Hyuk Park
- Applicant: Sang Hyuk Park
- Applicant Address: US DE Wilmington
- Assignee: Intellectual Ventures II LLC
- Current Assignee: Intellectual Ventures II LLC
- Current Assignee Address: US DE Wilmington
- Agency: McAndrews, Held & Malloy, Ltd.
- Priority: KR10-2005-0134264 20051229
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
An image sensor including a first region where a pad is to be formed, and a second region where a light-receiving element is to be formed. A pad is formed over a substrate of the first region. A passivation layer is formed over the substrate of the first and second regions to expose a portion of the pad. A color filter is formed over the passivation layer of the second region. A microlens is formed over the color filter. A bump is formed over the pad. A protective layer is formed between the bump and the pad to expose the portion of the pad.
Public/Granted literature
- US20120003776A1 IMAGE SENSOR AND MANUFACTURING METHOD FOR SAME Public/Granted day:2012-01-05
Information query
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