Invention Grant
US08222162B2 Batch processing method for forming structure including amorphous carbon film
有权
用于形成包括无定形碳膜的结构的批处理方法
- Patent Title: Batch processing method for forming structure including amorphous carbon film
- Patent Title (中): 用于形成包括无定形碳膜的结构的批处理方法
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Application No.: US12792274Application Date: 2010-06-02
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Publication No.: US08222162B2Publication Date: 2012-07-17
- Inventor: Mitsuhiro Okada , Yukio Tojo
- Applicant: Mitsuhiro Okada , Yukio Tojo
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2009-135483 20090604; JP2010-094417 20100415
- Main IPC: H01L21/31
- IPC: H01L21/31 ; H01L21/469

Abstract:
A batch processing method for forming a structure including an amorphous carbon film includes performing a preliminary treatment of removing water from a surface of the underlying layer by heating the inside of the reaction chamber at a preliminary treatment temperature of 800 to 950° C. and supplying a preliminary treatment gas selected from the group consisting of nitrogen gas and ammonia gas into the reaction chamber while exhausting gas from inside the reaction chamber; and, then performing main CVD of forming an amorphous carbon film on the underlying layer by heating the inside of the reaction chamber at a main process temperature and supplying a hydrocarbon gas into the reaction chamber while exhausting gas from inside the reaction chamber.
Public/Granted literature
- US20100311251A1 BATCH PROCESSING METHOD FOR FORMING STRUCTURE INCLUDING AMORPHOUS CARBON FILM Public/Granted day:2010-12-09
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