• Patent Title: Phosphorylcholine group-containing compound, method of manufacturing a phosphorylcholine group-containing compound, surface-modifying agent, and a method of modifying a surface using a surface-modifying agent
  • Application No.: US12521788
    Application Date: 2008-01-18
  • Publication No.: US08222443B2
    Publication Date: 2012-07-17
  • Inventor: Kazuyuki MiyazawaYukimitsu Suda
  • Applicant: Kazuyuki MiyazawaYukimitsu Suda
  • Applicant Address: JP Tokyo
  • Assignee: Shiseido Company, Ltd.
  • Current Assignee: Shiseido Company, Ltd.
  • Current Assignee Address: JP Tokyo
  • Agency: IPUSA, PLLC
  • Priority: JP2007-009482 20070118
  • International Application: PCT/JP2008/050642 WO 20080118
  • International Announcement: WO2008/088051 WO 20080724
  • Main IPC: C07F9/09
  • IPC: C07F9/09
Phosphorylcholine group-containing compound, method of manufacturing a phosphorylcholine group-containing compound, surface-modifying agent, and a method of modifying a surface using a surface-modifying agent
Abstract:
A phosphorylcholine group-containing compound that is a structure having a phosphorylcholine group represented by the following formula 1 and an amino group or a group derived from an amino group in an identical compound. (In the formula, m is 2 or more and 6 or less and p is 1 or 2. Each of X1, X2 and X3 is an alkyl group whose carbon number is 1 or more and 6 or less.)
Information query
Patent Agency Ranking
0/0